magnetron

1. Effect of Target Current on Structure and Characteristics of the Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering
   靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响
2. Microstructures and Tribological Properties of TiC/ a-C Films Grown by Magnetron Sputtering
   磁控溅射TiC/a-C薄膜的结构和摩擦学性能研究
3. ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
   采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
4. Fabrication and structure research of silicon films prepared by RF magnetron sputtering
   射频磁控溅射硅薄膜的制备与结构研究
5. Study and Design of Magnetron Power Source in Microwave Heating Equipment
   微波加热器磁控管电源的研究与设计
6. Development of high-power pulse magnetron sputtering technology
   高功率脉冲磁控溅射技术的发展与研究
7. Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
   工艺参数对直流磁控溅射膜沉积的影响
8. Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.
   利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
9. Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
   利用低频反应磁控溅射制备五氧化二铌光学薄膜。
10. Reviews the recent studies on the infrared low-emissivity thin films deposited by magnetron sputtering process on glass or other flexible substrates.
    本文介绍了采用磁控溅射法在玻璃和柔性衬底上镀制红外低辐射薄膜的研究进展。
11. Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
    沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。
12. The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
    从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
13. Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
    本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
14. Effects of Deposition Pressure on Nanocrystalline Silicon Thin Film by Magnetron Sputtering
    沉积压力对磁控溅射纳米硅薄膜结构和性能影响
15. Study On Expert PID Temperature Control in High Vacuum Magnetron Sputtering Coating Machine
    专家PID温度控制在高真空磁控溅射镀膜机中的应用研究
16. The functional requirements of a vacuum pressure measurement machine based on the principle of magnetron discharge was described.
    介绍了基于磁控放电原理的真空度测试仪的研制。
17. Design of the Control System of Vacuum Magnetron Sputtering& Coating Equipment Based on Industrial Computer and PLC
    基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计
18. Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure
    沉积压力对非平衡磁控溅射沉积MoS2-Ti复合薄膜的结构与性能影响研究
19. Repair Engineer: Oh, my God! I got it! The magnetron is out of order.
    维修工程师：哦，我的天啊！我找到了。磁控管坏了。
20. The development, principle and applications of magnetron sputtering technique are introduced in this paper.
    该文介绍了磁控溅射沉积技术的基本原理、发展及应用。
21. In this paper, we study the magnetron cavity used in atomic hydrogen maser.
    本文对磁控管腔进行了试验研究。
22. Helium-charged Al films are prepared by direct current ( DC) magnetron sputtering with a He/ Ar mixture.
    采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
23. The effects of hydrogen annealing on silicon carbide films grown on Si ( 111) substrates by radio frequency magnetron sputtering at room temperature are investigated.
    用射频磁控溅射法在常温硅衬底上制备了碳化硅薄膜并研究了氢退火对薄膜的影响。
24. Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.
    采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属／氟化高聚物复合薄膜。
25. Preparation of Multilayered Ge Nanocrystals by Magnetron Sputtering and Annealing Method
    用磁控溅射和退火方法制备多层锗纳米晶
26. Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering
    射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
27. Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency ( RF) magnetron sputtering with different sputtering power.
    应用射频磁控溅射技术在硅基底上制备氧化锡薄膜，着重研究溅射功率对薄膜结构和电化学性能的影响。
28. Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering.
    通过磁控溅射法制备了锑基铋掺杂超分辨掩膜材料。
29. All these multilayers are deposited by magnetron sputtering method on microcrystalline glass substrates.
    采用磁控溅射方法，在微晶玻璃制备了多层膜。
30. DC reactive magnetron sputtering;
    直流反应溅射；

noun

1. a diode vacuum tube in which the flow of electrons from a central cathode to a cylindrical anode is controlled by crossed magnetic and electric fields