maskless
英
美
adj. 无遮蔽的
双语例句
- Diffractive Optical Elements Arrays with Continuous Deep-relief for Maskless Lithography
用于并行激光直写的连续深浮雕衍射透镜阵列研究 - Distribution map serves as a visual statement of a class of data. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
分布图作为对一类资料的形象化陈述。优化掩模分布改善数字光刻图形轮廓 - Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓 - The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。 - This paper describes the maskless wiring formation technology not using photomask and photoresist, development of metal nano particle and nano ink, application of the inkjet method and future theme.
概述了不使用光致掩模和光致抗蚀剂的无掩模布线形成技术，金属纳米粒子和纳米油墨的研究开发，喷墨法的应用和今后的课题。 - In this paper a maskless bumping technique to create thin solder caps will be show.
文章将论述一种无掩模制造细小焊料凸点技术。 - Study on Maskless Etching of Silicon Symmetric Beam-Mass Structure in Aqueous KOH
KOH溶液无掩膜腐蚀加工硅对称梁技术研究 - Focused Ion Beam is an advanced micro~ nano technology for figure observation, orientation making-sample, component analysis, film deposition and maskless etching.
20世纪90年代发展起来的聚焦离子束技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。 - Application of Diffractive Optics Elements in Maskless Lithography
衍射光学元件在无掩模光刻中的应用 - The advantage for the maskless lithography technology be reduce the mask costs.
说明了无掩模光刻技术的最大优点即是降低掩模成本； - Research on focused ion beam maskless etching
聚焦离子束无掩模刻蚀研究 - As for the reality and application of maskless lithography, this paper studies the micro-actuator, defocusing sources, dynamic focusing characteristics, system hardware, system software, fabrication of rotation symmetric figure, etc.
在无掩膜光刻系统的实现和应用方面，研究了微位移执行器、动态离焦源、调焦动态特性、系统硬件、系统软件，以及在制作旋转对称图形上的应用等等。 - The study of this dissertation consists of three parts: the principle and design of focusing unit in maskless lithographic system, the theory of defocusing lithography for width-variable line, and the reality and application of maskless lithographic system.
本论文研究了无掩膜光刻调焦系统的光学原理与设计，还研究了可变线宽的离焦光刻理论，此外也对无掩膜光刻系统的实现和应用进行了分析。 - Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.
模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。 - The basic principle, theory, main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution, deep sub-micron and nanometer patterns in large field of view are deeply investigated.
深入研究了无掩模激光干涉光刻技术用于高分辨、大视场、深亚微米和纳米图形生成的基本原理、理论、主要类型和实现方法。 - The methods and systems ( including amplitude division double-beam interference system, three-beam interference system, liquid immersion type deep UV interference system and full automatic interference photolithographic system) for amplitude division maskless laser interference photolithography are studied and compared.
研究和比较了振幅分割无掩模激光干涉光刻方法和系统，包括振幅分割双光束干涉系统、三光束干涉系统、液浸式深紫外干涉系统及全自动干涉光刻系统。 - Maskless Printing of Miniature Polymer Thick Film Resistors for Embedded Applications
应用无掩膜印刷术埋嵌微型聚合物厚膜电阻 - A new integrated microplasma etching system based on scanning micro probe was presented in our group, and a microplasma maskless etching can be realized with high efficiency and high resolution.
我们提出了一种基于扫描探针的微等离子体加工方法，以实现集成化、高效率、高分辨率的微等离子体无掩膜刻蚀。 - Therefore, our research group proposes a non-cantilever structure for maskless etching so called tip array structure.
因此，课题组提出了无悬臂梁结构的微放电器针尖阵列的无掩模刻蚀加工方法。 - In compare, direct writing technology has attracted great attention for the virtues of maskless, high-flexibility, high-precision, fast-fabrication, high-reliability, low-cost and wide-adaptability to materials.
与传统方法相比，直写技术（DirectWriting）由于具有无掩模、高柔性化、加工精度高、速度快、可靠性程度高、成本低以及适用的材料范围广泛等优点而倍受人们的重视。 - So, how to reduce mask cost and utilizing maskless lithography technology has become an important subject for a lithography engineer to study.
于是，如何在光刻技术中降低掩模成本，采用无掩模光刻技术已成为光刻工程师研究的一个重要课题。 - In recent years, optical maskless lithography technique based on spatial light modulator ( SLM) has been attracted wide attentions.
近年来，空间光调制器（SLM）无掩模光刻技术受到微电子及相关领域的广泛关注。 - The vacuum system for maskless lithography is set up completely. The transformation from CIF to binary coding which can be recognized by the micropositioner is accomplished. 3.
2，完整的制作了一套无掩模光刻平台，并完成了CIF版图文件到微动台可识别的二进制编码的转换。 - Laser maskless lithography technology has high machining precision, high resolution, and small processing feature sizes, which is suitable for the processing of small parts.
激光无膜光刻技术具有加工精度高、加工分辨率高和可加工特征尺寸小的特点，适合于微小零件和零件微小特征的加工。 - Laser direct writing is an important micro-fabrication technology. It has the advantages of high precision, powerful 3D fabrication ability, maskless, high efficiency and so on.
激光直写技术作为一种重要的微加工技术，具有精度高、三维加工能力强、无需掩膜一次成型等优势。 - Laser interference nanolithography is one of effective technologies for generating periodical and nanoscale patterns, The technology has the advantages of high-resolution, low cost, large area and maskless patterning.
激光干涉纳米光刻是产生周期性、纳米级图案的有效技术之一，该技术具有无掩模、长焦深、高分辨率、成本低、容易实现大面积等优点。