photoetching
英
美
n. 光刻
双语例句
- Brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.
采用高频脉冲微束等离子弧做为电子管阴极和光刻栅极装配钎焊工艺的热源，提高了钎缝质量和产品的可靠性。 - Photoetching of CdS was monitored by measuring dissolved Cd~ ( 2+) using an electrochemistry method.
通过电化学方法测定溶液中Cd~（2+）的量以确定CdS光刻蚀程度。 - Application of photoetching technology on the fabrication electrodes made PVDF piezoelectric-film
光刻技术在PVDF压电薄膜电极制作中的应用 - The paper points out that there is a good prospect in using DC-TAC as photoetching material of micro-optical elements.
指出了DC&TAC作为微光学元件光刻材料的重要应用前景。 - Photoetching diaphragm in burst valve application
光刻膜片在膜片阀中的应用 - Development of Radial Metal Grating by Photoetching Technique
运用光蚀刻技术制造金属光栅盘 - Precision Location Platform Used in X-ray Photoetching Machine
X射线光刻机中应用的精密定位工作台 - In the process, using Nicon photoetching improves the photoetch quality;
在工艺中，应用Nicon光刻机，提高了光刻质量； - The step automatic alignment system for projection photoetching machines is introduced, and its working principles are analyzed.
介绍了投影光刻机的分步重复自动对准光刻系统，分析了其工作原理； - The process of plugging big channel with gel has been observed under microscope by using microsimulation photoetching model.
本研究利用微观仿真光刻模型在显微镜下观察了凝胶堵塞大孔道的过程； - This paper described a type of IR temperature measuring device designing that was used in albumen ceramics photoetching process.
本文简述了一种用于蛋白陶瓷照相工艺中的红外测温装置的设计。 - In this paper, an optical alignment system is introduced using gratings with different constant for the step projection photoetching machine.
介绍一种在分步投影光刻机中，采用不等栅距光栅进行对准的系统。 - The exposure system is an important component of the photoetching equipment and its performance is one of the main properties of the equipment.
曝光系统是光刻机的重要组成部分，其性能的好坏也是光刻机性能的主要指标。 - Study on the Synchronizing Control and Wafer Deformation Error Compensation Technology for Step Scanning Photoetching Machine
步进扫描光刻机同步控制及硅片变形误差补偿技术研究 - A study of the synthesis of six new polyester type negative photoresists, together with their UV, IR, DIA and photoetching properties is made by the authors.
本文研究了六种新的聚酯型负性光致抗蚀剂的合成，分别测定了它们的UV、IR、DTA和光刻性能。 - This paper introduced principle, process, characteristics and controlling deep slot of spiral groove movable ring of photoetching in the liquid hydrodynamic seal. The new method of high-energy ions etching spiral groove movable ring was put forward.
主要介绍了流体动力密封螺旋槽动环光刻工艺的特点、原理、工艺过程、工艺流程、槽深控制方法以及应用情况，提出了采用高能束流刻蚀螺旋槽动环的新途径。 - Study On The Visual Angle of Computerized Photoetching Hologram
计算机光刻全息图的视角研究 - This paper describes the principle and the properties of excimer laser, and introduces the results of the excimer laser photoetching experiments and Φ 3in substrate uniformity compensating test.
详细叙述了准分子激光的工作原理和工艺特性，介绍了准分子激光光刻实验及Φ3英寸基片均匀性补偿试验的研制结果。 - Photoetching Technology of ITO-coated Glass
ITO玻璃光刻工艺的研究 - Application of photoetching in the integral catalyst bed
光刻技术在整体式层板催化剂床研究中的应用 - By analyzing the photoetching technique of the slot antenna array, the paper expounds how to manufacture the slot antenna array by photoetching, as well as the results and main problems of the experiments.
对缝隙天线阵面的光刻技术进行了分析，对采用光刻技术方法研制缝隙天线阵面的技术途径、工艺实验的结果和主要问题进行了论述。 - The second was the study on enhancement of photocatalytic activity of cadmium sulfide for hydrogen evolution by photoetching.
光刻蚀法改性硫化镉半导体光催化剂及对其放氢活性的影响。 - New Cold Light Source and Home-made Photoresist for Photoetching High Precision Grating Rules
应用新光源、国产光致抗蚀剂，光刻高精度长光栅 - Antenna Array Manufactured by Photoetching Technology
用光刻技术制作天线阵面 - Study of Some Problems in Photoetching Production Line in the Laboratory
光化学蚀刻实验线的一些问题研究 - Application of photoetching to liquid hydrodynamic seal
光刻技术在流体动力密封研究中的应用 - Brazing for assembling cathode and photoetching grid of electron tube using high frequency pulse plasma flame
电子管阴极和光刻栅极的高频脉冲等离子弧钎焊 - A Study on the Automatic Alignment System of Photoetching Equipment
光刻自动对准系统的研究 - The affections of different surface treatments by mechanical polishing, chemical etching and photoetching to the properties of electrodes have also been discussed.
探讨了机械抛光、化学抛光和光抛光等不同表面处理方法对电极特性的影响。 - Finally, the LC resonant strain sensor samples with minimum line width of100 μ m were prepared by the technologies of photoetching and etching. The performances of the sensors were tested by strain cantilever system and vector network analyzer.
最后，采用光刻、刻蚀工艺完成最小线宽为100μm的LC谐振应变传感器样品的制备，设计了应变测试悬臂梁系统，采用矢量网络分析仪对传感器样品的性能进行了测试。