photolithography

1. Systematic Control Exploitation for Critical Dimension and Overlay in Photolithography Technology
   光刻工艺中对线宽和套刻系统性控制的开发
2. Photolithography equipment, the bottleneck and the most expensive equipment in wafer fabrication, is comprised of serial cluster tools.
   光刻机是半导体晶圆制造的瓶颈设备，其费用相当昂贵。
3. Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
   分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
4. Justifying machine for use in photolithography or offset printing
   齐行机，照相平板版印刷或胶版印刷用
5. Distribution map serves as a visual statement of a class of data. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
   分布图作为对一类资料的形象化陈述。优化掩模分布改善数字光刻图形轮廓
6. The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
   首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
7. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.
   化学需氧量（沉淀）课堂讲授和实验课重点介绍了基本的工艺技术，如扩散、化、刻、学汽相淀积以及其它。
8. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
   优化掩模分布改善数字光刻图形轮廓
9. Evanescent wave fiber-optic sensors ( EWFS) with acicular encapsulation were fabricated using silicon photolithography technology and silica wet-etching technology.
   用硅光刻工艺和二氧化硅湿法腐蚀工艺制作了针状封装结构的光纤消逝场传感器。
10. For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
    针对纳米压印光刻技术中压印脱模后的留膜去除问题，提出了一种基于光刻版的无留膜紫外纳米压印技术。
11. Premium Wafer-A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.
    测试晶圆片-影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。
12. The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
    无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
13. Alignment Precision-Displacement of patterns that occurs during the photolithography process.
    套准精度-在光刻工艺中转移图形的精度。
14. The utility model can protect the film from pollution and increases the printing quality of photolithography during the production of semiconductor integrated circuits.
    本实用新型可保护薄膜不受污染，提高半导体集成电路生产过程中的照相平版印刷质量。
15. In order to find the best fabrication control combination, this paper studied rework strategies to be applied in coordination with some commonly used dispatching rules at the photolithography stage.
    本文讨论在微影黄光区中几种再加工策略，并与常用的派工法则配合，期找出最适的生产控制组合。
16. The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.
    最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。
17. Dynamic Scheduling of Photolithography Process Based on Kohonen Neural Network
    基于Kohonen神经网络的晶圆光刻流程动态调度方法
18. The lift-off technic based on traditional photolithography using positive photoresist, which requests the thickness of photoresist must be more than that of thin film.
    基于一般正胶光刻工艺的剥离工艺，所需胶膜的厚度要大大超过剥离薄膜的厚度。
19. Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography, they minimize the blurring caused by diffraction.
    由于这类型辐射的波长远较现在光蚀刻使用的紫外光来得短，因此可以减少因绕射而造成的模糊。
20. Silicon Nitride Thin Film Deposited by PECVD as a Protecting Layer on Photolithography Mask
    PECVD淀积Si3N4作为光刻掩膜版的保护膜
21. Corrugated High-order Bragg Grating on Silicon-on-insulator Ridge Waveguides Fabricated by Photolithography
    高阶布拉格光栅在SOI脊形波导上的光刻制作
22. The washer type bicrystal junction dc SQUID magnetometer was patterned using standard photolithography and ion-etching methods.
    通过标准光刻和离子束刻蚀工艺制备出了高温超导垫圈型双晶结dcSQUID磁强计。
23. An ultrahigh vacuum evaporation equipment used for atom photolithography is designed and constructed.
    在对各种材料和真空泵性能综合考虑的基础上，设计并建立了一台用于原子光刻的超高真空蒸发设备。主要设计参数为：极限真空度和工作真空度分别为2.0？
24. This paper introduces a new near-field photolithography technology.
    介绍了一种新的近场光刻技术的基本原理及其在光刻方面的应用研究的最新进展。
25. The micro-maching technology major include photolithography and etching technology.
    微加工技术主要包括光刻技术和刻蚀技术。
26. Radio frequency magnetron sputtering and photolithography were used to prepare Pt interdigital electrodes on the SiO2/ Si substrate.
    采用磁控溅射和光刻工艺在SiO2/Si基底上制作Pt叉指电极，将单根纳米带组装在电极上，制备出基于单根纳米带的光电导半导体开关。
27. Therefore, the stability of the Photolithography process is significant for research to ensure product quality.
    所以，对光刻工艺的稳定性进行研究对保证产品质量有着重要的意义。
28. We also get preliminary results for mask layer deposition, photolithography and etching.
    此外，还得到一些掩模层制备、光刻、刻蚀等工艺测试的初步结果。
29. The prototype of the micro actuator is fabricated by means of micro electroforming and SU-8 photolithography techniques.
    利用SU-8光刻胶制备电铸模和微电铸工艺，制造了二维微执行器原型。
30. Involved in the process include: oxidation, photolithography, etching, injection process.
    所涉及到的工艺主要包括：氧化工艺、光刻工艺、注入工艺、刻蚀工艺。

noun

1. a planographic printing process using plates made from a photographic image