reticle

1. Act of moving a mask or reticle to match up alignment marks. Hot plate with silicon wafer lowered to heating position.
   对准，调整掩模和晶片之间的位置。加热板与矽晶圆降低至加热位置。
2. An image processing system computes the size of the reticle image and the focal length.
   图像处理系统将计算十字线的像的尺寸和焦距。
3. It has range-finding reticle and built-in compensator for bullet drop.
   具有测距标线和内置的子弹下降补偿。
4. You could see their faces plainly in the reticle, and they weren't happy.
   你可以从十字准星里看到他们面无表情，他们显得并不高兴。
5. The Tritium illuminates the aiming point in total darkness, and the fiber-optic self-adjusts reticle brightness during daylight according to ambient light conditions.
   三重氢照明被用在完全黑暗状态，而视觉纤维（自动调节）用在白天或者可以说在有外界光线的情况下。
6. Slanted opaque bar reticle oblique rectifying table with curved side
   不透明斜条形调制盘侧弯矫形用斜面手术台
7. A sliding mode synchronization controller of the reticle stage was added to the conventional PID control system.
   在常规PID控制系统基础上增加了掩模台精动滑模同步控制器。
8. Functioning as a loadport the system can accept a reticle dual pod directly from the scanner for transfer to the mask cleaning tool.
   InSync系统则可直接从掩膜板用容器内接受掩膜板，并直接将其传送到掩膜清洗工具上去。
9. Multi-feature Fusion Recognition and Sub-pixel Locating Algorithm of Sighting Reticle
   瞄准分划的多特征融合识别与亚像素定位算法
10. The aBsorption of small farms into a Big one field stop reticle combination
    合并小农场成一大农场视场光阑-调制盘组合
11. Recent progress in technology of wafer stage and reticle stage used in step-and-scan lithography system is introduced, and the overlay accuracy and the accuracy of the overall system are analyzed.
    着重介绍了当前国外步进扫描投影光刻机的工件台和掩模台的发展状况，并对套刻精度和整机精度进行了分析。
12. To the radar/ fire control system, the aiming reticle and its simulation principle are emphasized.
    对于雷达火控系统，着重讨论了平显瞄准环的仿真原理。
13. At a repetition rate nearly equal to the carrier frequency of the reticle system, the jamming source will disturb the target's signal received by the seeker, and make the seeker lose the target.
    而重复频率近似等于调制盘系统调制波形载频的光脉冲会干扰导引头接收到的目标信号，使导引头失去目标。
14. In this paper, we present a reticle method for exactly measuring Gaussian optical spot parameter.
    本文介绍一种精确测量高斯光斑参数的调制盘方法，它能快速和精确的测量高斯光斑参数。
15. Thermal Distortion of EUV Reticle during Exposure
    EUV掩模版在曝光过程中的热变形
16. The Requirements of Image Quality in Optical System for Reticle Design of Infrared Search Servosystems and Its Install Errors
    红外搜索跟踪系统中调制盘对光学系统的像质要求及其安装公差的研究
17. Single linear CCD linearity collimator based on M shape reticle
    基于M型分划丝的单线阵CCD直线度准直仪
18. Introduce the New Reticle of Metal Foil
    介绍一种新型的金属箔分划板
19. The matching conditions between the transparent radial strip of the reticle and the blur circle of target image is then predicted.
    从而预示出调制盘透光辐条和目标像弥散圆的匹配情况。
20. The processing technologies, testing method, abrasive and accessory materials used in processing procedure of reticle are introduced in the paper.
    本文主要介绍调制盘的加工工艺与测试方法以及加工过程中所用的磨料与辅料。
21. To improve the alignment accuracy, an automatic alignment algorithm for 100 nm CD reticle-wafer was constructed. The algorithm was applied in Si wafer, reticle and workpiece flat alignment model in co-axis off-axis alignment system.
    为了改善对准精度，对100nm级线宽尺寸建立了掩模硅片自动对准数学模型，应用于同轴离轴混合对准系统的硅片模型、掩模模型以及工件台模型中。
22. Suppose a optical spot is of a Gaussian intensity distribution and is modulated by a sectored reticle, then the parameters of this optical spot can be exactly derived from measurements of the harmonic amplitude spectrum.
    假若光斑的强度分布是高斯模式，经扇形调制盘调制，测量主频的各次谐波振幅，能推算出高斯光斑的参数。
23. A new method is presented to measure movement displacement of two-dimensional exact worktable when applying grating as standard reticle.
    利用计量光栅的栅距作为基准刻线，对二维精密工作台的运动位移进行测量，提出了一种新的位移测量方法。
24. The traditional method to use Autocollimator is to interpret the pattern on the reticle through the eyepiece of the instrument. A long time operation is likely to cause eyestrain, increase the alignment error and reading error, and reduce efficiency.
    传统的光学自准直比较测角仪都是依靠人眼从仪器的目镜中观察分划板，长时间操作容易造成测量人员眼睛疲劳，增大瞄准读数误差，降低工作效率。
25. The principle of placement and routing of layout should be tried hard to minish material, favor photoetching, proofread reticle conveniently and simplify technology process. The article summarizes the rule of placement and routing.
    版图布局布线的原则是要力图节省材料、利于光刻、制版对准方便和工艺步骤简单，本文对布局布线总结了一些规律。
26. The system through the five prism method to the detected parallel light pipe fo defocus detection, again using the vibrating slit assembly of the detected collimator reticle to capture image center position energy.
    该系统通过五棱镜法对被检平行光管进行离焦检测，再利用振动狭缝组件对被检平行光管分划板像的中心位置进行能量的捕捉。
27. After the SVM data-training, the Post-OPC hotspots on reticle can be predicted without defining any types of hotspot.
    在支持向量机中进行训练后，能进行光学邻近校正后版图的热点检测且无需定义热点类型。
28. The second chapter introduces the overall design principles and methods. The measurement parameters and design of reticle are also referred.
    第二章介绍了检查仪系统的总体设计思想和方法，测量的原理和课题所要检测的参数。
29. Get the detected reticle deviating angle value by computer analysis, thereby realizing the calibration.
    经计算机分析得出被检分划板的偏离角度值，从而实现校准。

noun

1. a network of fine lines, dots, cross hairs, or wires in the focal plane of the eyepiece of an optical instrument

   Synonym:    reticulegraticule