VERB (发动机)发出噼啪声;(火焰)发出毕剥声 If something such as an engine or a flame sputters, it works or burns in an uneven way and makes a series of soft popping sounds.
The truck sputtered and stopped... 卡车噼啪响了几声停下了。
Engines sputtered to life again... 发动机噼啪噼啪地重新开动了。
The flame sputters out. 火焰毕剥作响。
...the sputtering engine. 噼啪作响的发动机
Sputter is also a noun.
All I could hear was the sputter of the fire. 我只能听到火的毕剥声。
VERB (过程、行动或事态)缓慢不稳地进行,慢慢结束 If a process, action, or state of affairs sputters, it progresses slowly and unevenly or starts to end.
The economy is already sputtering, with low or no growth... 经济发展速度已经放慢,增长率很低,或者根本没有增长。
The battle sputtered to a halt in mid-October... 战斗于 10 月中旬渐渐停了下来。
The whole thing sputtered out. 整个事态渐渐平息了下来。
VERB (尤指因生气、震惊或激动)结结巴巴地说话,语无伦次地说话 If you sputter, you speak with difficulty and make short sounds, especially because you are angry, shocked, or excited.
Stunned, I sputtered, 'What do you mean?'... 我大吃一惊,结结巴巴地问道:“你是什么意思?”
Our father's face had reddened with rage and he began to sputter... 我们的父亲气得涨红了脸,说话开始语无伦次。
The economy is already sputtering, with low or no growth 经济发展速度已经放慢,增长率很低,或者根本没有增长。
The sputtering pressures plays an important role on the microstructure and electrical resistivity of TAZO films. 溅射压强对薄膜的电阻率和微观结构有显著影响。
Influence of RF sputtering power and doped hydrogen on the structure of Si ∶ Hfilms 射频溅射功率和掺杂氢对硅氢薄膜结构的影响
Self-consistent description of a DC hollow cathode discharge and analysis of cathode sputtering 空心阴极直流放电的二维自洽模型描述和阴极溅射分析
Microstructures and Tribological Properties of TiC/ a-C Films Grown by Magnetron Sputtering 磁控溅射TiC/a-C薄膜的结构和摩擦学性能研究
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature. 采用直流磁控溅射工艺,室温下在载玻片上制备了氧化锌铝透明导电薄膜。
Fabrication and structure research of silicon films prepared by RF magnetron sputtering 射频磁控溅射硅薄膜的制备与结构研究
The sputtering power has a great influence upon the structural and electrochemical properties of tin oxide films. 溅射功率对薄膜的电化学性能有较大的影响。
Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering. 利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system. 利用低频反应磁控溅射制备五氧化二铌光学薄膜。
Influence of Substrate Temperature on Performance of Transparent Conductive ZAO Film Deposited by RF Sputtering 衬底温度对射频溅射沉积ZAO透明导电薄膜性能的影响
Deposition rate is an important parameter in magnetron sputtering and influenced by many factors. 沉积速率是磁控溅射镀膜技术中的一项重要指标,它由许多因素决定。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically. 从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
Polymer fluorocarbon films on polyester were prepared under various discharge conditions by ion-beam sputtering and characterized by using XPS. 在不同放电条件下利用离子束溅射法制备了聚酯膜基底上的氟碳高分子膜。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method. 本文利用射频磁控溅射方法,在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
Effects of Deposition Pressure on Nanocrystalline Silicon Thin Film by Magnetron Sputtering 沉积压力对磁控溅射纳米硅薄膜结构和性能影响
The technics of two kinds of thin film gas sensors made by powder sputtering are introduced. 介绍了用粉末溅射做出的两种平面薄膜型酒敏元件的工艺、芯片结构和基本参数测试的结果。
Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure 沉积压力对非平衡磁控溅射沉积MoS2-Ti复合薄膜的结构与性能影响研究
Influence of argon ion bombardment and sputtering power on the structure and properties of Cu thin film 氩离子轰击和溅射功率对Cu薄膜结构及性能的影响
The development, principle and applications of magnetron sputtering technique are introduced in this paper. 该文介绍了磁控溅射沉积技术的基本原理、发展及应用。
Uses: sputtering target, physical vapor deposition, high temperature alloys. 溅射靶材、物理气相沉积、高温合金。
In sputtering, argon is commonly used, havingthe advantage that it is an atomic gas and chemicallyinert. 溅射中我们通常使用氩,优点是氩是一种原子气体,而且在化学性质上是惰性的。
The effects of hydrogen annealing on silicon carbide films grown on Si ( 111) substrates by radio frequency magnetron sputtering at room temperature are investigated. 用射频磁控溅射法在常温硅衬底上制备了碳化硅薄膜并研究了氢退火对薄膜的影响。
Deposition rate is increase quickly with sputtering power. 结果表明溅射功率对沉积速率的影响最大,随溅射功率的增大沉积速率快速增大。
Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. 采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜。
Through testing and analysing on the optoelectronic properties of them, effects of sputtering temperature on TiOx thin films were discussed. 通过对其光电性能的分析测试,探讨了溅射温度对氧化钛薄膜性能的影响。
Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering 射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency ( RF) magnetron sputtering with different sputtering power. 应用射频磁控溅射技术在硅基底上制备氧化锡薄膜,着重研究溅射功率对薄膜结构和电化学性能的影响。
Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering. 通过磁控溅射法制备了锑基铋掺杂超分辨掩膜材料。
All these multilayers are deposited by magnetron sputtering method on microcrystalline glass substrates. 采用磁控溅射方法,在微晶玻璃制备了多层膜。